发明名称 STRESS HOLDING DEVICE AND X-RAY DIFFRACTION DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a stress holding device and an X-ray diffraction device having a low device height, allowing incidence of X-rays of wide angles and holding optional stress. SOLUTION: The device capable of optionally setting load applied to a specimen 1 is constituted by changing a load direction using at least a pair of wedges 13, 14, and applying four-point bending load to the specimen 1 of plate shape to hold a uniform stress state, and furthermore installing a plate mounted with a load cell 15 formed of a strain gauge, between the specimen 1 and the wedges 13, 14. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009008665(A) 申请公布日期 2009.01.15
申请号 JP20080133826 申请日期 2008.05.22
申请人 TOHOKU UNIV 发明人 SOYAMA HITOSHI;KAI AKIRA;TAKAKUWA SHU
分类号 G01N23/20;G01N3/20 主分类号 G01N23/20
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