摘要 |
PROBLEM TO BE SOLVED: To provide a stress holding device and an X-ray diffraction device having a low device height, allowing incidence of X-rays of wide angles and holding optional stress. SOLUTION: The device capable of optionally setting load applied to a specimen 1 is constituted by changing a load direction using at least a pair of wedges 13, 14, and applying four-point bending load to the specimen 1 of plate shape to hold a uniform stress state, and furthermore installing a plate mounted with a load cell 15 formed of a strain gauge, between the specimen 1 and the wedges 13, 14. COPYRIGHT: (C)2009,JPO&INPIT
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