发明名称 |
Zusammensetzung für Polierkissen und Polierkissen das diese Zusammensetzung verwendet |
摘要 |
An object of the invention is to provide a polishing pad having the excellent slurry retaining properties and the large removal rate and a composition for a polishing pad which can form such the polishing pad. A composition for polishing pad of the invention is comprising a water-insoluble matrix material containing a crosslinked polymer and a water-soluble particle dispersed in the water-insoluble matrix material. The elongation remaining after breaking is 100% or smaller when a test piece comprising the water-insoluble matrix material is broken at 80 DEG C according to JIS K 6251. A polishing pad of the invention is that at least a part of the polishing pad comprises the composition for polishing pad. |
申请公布号 |
DE60132399(T2) |
申请公布日期 |
2009.01.15 |
申请号 |
DE2001632399T |
申请日期 |
2001.05.30 |
申请人 |
JSR CORP. |
发明人 |
OGAWA, TOSHIHIRO;HASEGAWA, KOU;KAWAHASHI, NOBUO |
分类号 |
B24B37/00;C08L21/00;B24B37/04;B24B37/20;B24B37/24;B24D3/28;B24D3/32;C08L3/02;C08L101/00 |
主分类号 |
B24B37/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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