| 摘要 |
PROBLEM TO BE SOLVED: To solve a problem wherein, when an electric field or a voltage on a surface of a sample is changed in accordance with a characteristic of the sample, the arrangement of a plurality of primary beams on the sample surface, and a plurality of secondary beams on a detector is changed, in a multi-beam type charged particle beam application device. SOLUTION: Calibration is executed in order to adjust primary beams 110 on the sample surface to an ideal arrangement in response to the change of operating conditions of inspection conditions and the like such as an electric field on the sample surface, and a voltage applied to the sample in accordance with the characteristic of the sample. The arrangement of the primary beams 110 on the sample surface is acquired as an image of a reference mark 116 on a stage 117 displayed on an image display part 136. A deviation amount from an ideal state of the reference mark 116 is measured from the image, and is corrected by adjustment of a primary electron optical system 108 and the like. Similarly, calibration is executed by adjusting a position where a secondary beam detector 121 is irradiated with a plurality of secondary beams by using the output of the secondary beam detector 121. COPYRIGHT: (C)2009,JPO&INPIT |
