发明名称 ELECTRON BEAM DRAWING DEVICE AND CURRENT DENSITY ADJUSTMENT METHOD FOR ELECTRON BEAM
摘要 PROBLEM TO BE SOLVED: To provide a device and method that can adjust the current density of an electron beam during drawing. SOLUTION: The drawing device 100 includes: an electron gun 201 which emits an electron beam 200; an electron gun power source 230 which receives a control value and controls the electron gun 201 based upon the control value; a current density measuring section 242 which measures the current density of the electron beam 200 a plurality of times while drawing on a sample is performed; and a PID control section 244 which calculates the control value varying with the measured current density so that the current density becomes nearly constant each time the current density is measured, and outputs the control value to the electron gun power source 230 each time the control value is calculated. The current density of the electron beam can be consequently kept nearly constant during the drawing. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009010078(A) 申请公布日期 2009.01.15
申请号 JP20070168520 申请日期 2007.06.27
申请人 NUFLARE TECHNOLOGY INC 发明人 SAITO KENICHI
分类号 H01L21/027;H01J37/06;H01J37/305 主分类号 H01L21/027
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