发明名称 FILM FORMING MASK
摘要 PROBLEM TO BE SOLVED: To realize a film-forming mask capable of forming a pattern thin film of an organic EL element in a pixel uniformly and in high definition. SOLUTION: For a deposition mask equipped with an opening 1 for mask film forming on a deposition substrate, metal films 2 are formed on the surface of a mask member 3 on an opposite side of the deposition substrate and a side face 1a of the opening 1. With this, a diameter of the opening 1 is contracted by a thickness H2 of the metal film 2 to enable higher definition of the pattern thin film. Moreover, by forming the metal film 2 only on the surface opposite to the deposition substrate side of the mask member 3, mask strength can be improved while an increase of mask thickness is suppressed to heighten durability. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009009777(A) 申请公布日期 2009.01.15
申请号 JP20070168747 申请日期 2007.06.27
申请人 CANON INC 发明人 SODA TAKEHIKO
分类号 H05B33/10;C23C14/04;H01L51/50 主分类号 H05B33/10
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