发明名称 SUBSTRATE PROCESSING EQUIPMENT, AND SHOWERHEAD
摘要 PROBLEM TO BE SOLVED: To provide the substrate processing equipment that can perform uniform processing operation using a showerhead having a shower plate whose gas discharge part employs a double layer structure of metal and ceramics. SOLUTION: A showerhead 18 has a metallic upper plate 61 on which a gas lead-in hole 61a is formed, a metallic lower plate 62 on which many gas passing-through holes 66 are formed, a gas diffusing space S provided between the upper plate 61 and the lower plate 62, a ceramics-made cover member 64 that is provided to cover a whole area of the underside on the lower plate 62 and where many gas discharging holes 67 are formed corresponding to the gas passing-through holes 66, and heat transfer members 70a, 70b that are provided for connection between the upper plate 61 and the lower plate 62 in the gas diffusing space S to transfer the heat generated along with the processing operation to the upper side. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009010101(A) 申请公布日期 2009.01.15
申请号 JP20070168861 申请日期 2007.06.27
申请人 TOKYO ELECTRON LTD 发明人 IIZUKA YASHIRO
分类号 H01L21/3065;C23C16/455;C23C16/505;H01L21/31 主分类号 H01L21/3065
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