| 发明名称 |
TRANSPARENT INSULATING FILM, METHOD FOR PRODUCING THE SAME, AND SPUTTERING TARGET |
| 摘要 |
A method for producing a transparent insulating film includes a step of forming a transparent insulating film on a substrate by sputtering using a zinc-aluminum alloy target containing 50% to 90% by weight zinc and 10% to 50% byt weight aluminum in a mixed gas atmosphere of an inert gas and oxygen gas.
|
| 申请公布号 |
US2009014319(A1) |
申请公布日期 |
2009.01.15 |
| 申请号 |
US20080166471 |
申请日期 |
2008.07.02 |
| 申请人 |
SONY CORPORATION |
发明人 |
KIRITA SHINA;KAWASHIMA TOSHITAKA |
| 分类号 |
C23C14/14 |
主分类号 |
C23C14/14 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
