发明名称 METHOD AND APPARATUS FOR PREPARING TRICHLOROSILANE AND METHOD FOR PREPARING POLYCRYSTAL SILICON
摘要 <p><P>PROBLEM TO BE SOLVED: To inhibit polymer production, to conduct polymer decomposition and to improve conversion efficiency in a method and an apparatus for preparing trichlorosilane. <P>SOLUTION: The method and the apparatus for preparing trichlorosilane comprise: a conversion reaction step (first reaction step) of carrying out conversion reaction of tetrachlorosilane and hydrogen, which are raw materials, within a first temperature range of 1,000-1,900°C to obtain a first reaction produced gas comprising trichlorosilane, dichlorosilylene, hydrogen chloride and a higher silane compound; a first cooling step of cooling the first reaction produced gas to≤950°C within 1 sec (but not cooling to <600°C within 0.01 sec); a second reaction step of keeping the first reaction produced gas within a second temperature range of 600-950°C for 0.01-5 sec; and a second cooling step of cooling a second reaction produced gas obtained after the second reaction step to <600°C. A method for preparing a polycrystal silicon using the trichlorosilane is also provided. <P>COPYRIGHT: (C)2009,JPO&INPIT</p>
申请公布号 JP2009007240(A) 申请公布日期 2009.01.15
申请号 JP20080127143 申请日期 2008.05.14
申请人 MITSUBISHI MATERIALS CORP 发明人 SAIKI WATARU;MIZUSHIMA KAZUKI;URUSHIBARA MAKOTO
分类号 C01B33/107 主分类号 C01B33/107
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