发明名称 CHARGED PARTICLE BEAM EQUIPMENTS, AND CHARGED PARTICLE BEAM MICROSCOPE
摘要 In an electron microscope to which a phase retrieval method is applied, an image size determined by a pixel size p of a diffraction pattern, a camera length L, and a wavelength lambda of an illumination beam is allowed to have a certain relation with an illumination area on a specimen. Further, a beam illumination area or a scanning area of a deflector when a magnified image is observed is set by an illumination adjustment system, so that an image size when the magnified image is used for the phase retrieval method is allowed to have a certain relation with the image size determined by the pixel size of the diffraction pattern, the camera length, and the wavelength of the illumination beam. Accordingly, the information of the diffraction pattern is substantially equal to an object image to be reconstructed.
申请公布号 US2009014651(A1) 申请公布日期 2009.01.15
申请号 US20080168940 申请日期 2008.07.08
申请人 HITACHI, LTD. 发明人 KAMIMURA OSAMU;OHTA HIROYA
分类号 H01J37/28 主分类号 H01J37/28
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