| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of manufacturing a capacitor which can prevent leaning phenomenon that may cause a storage node bridge during wet-etching to form a cylindrical storage node structure and drying process. SOLUTION: The method includes the steps of exposing an upper part of a cylindrical storage node 25 formed on a substrate 21 having a cell region and a peripheral circuit region, forming a mesh type support 26C of amorphous carbon supporting the exposed upper portion of the storage node 25, forming a capping film on the support 26C, opening a peripheral circuit region and removing the capping film in the peripheral circuit region using the mask to cover the cell region, removing the support 26C for the mask and the peripheral circuit region, removing the capping film remaining in the cell region and a sacrificial film remaining in the cell region and the peripheral circuit region, and removing the support remaining in the cell region. COPYRIGHT: (C)2009,JPO&INPIT
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