| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposing apparatus capable of preventing an excessive lowering of measuring accuracy due to a lighting condition for exposing a substrate. <P>SOLUTION: This exposing apparatus EX includes: a measuring system M for performing measurement for controlling exposure via a first mark Rm positioned in an original plate stage RS and a second mark wm positioned in a substrate stage WS; and a control part CNT capable of setting a lightening condition different from a lightning condition under measurement by a measuring system M for exposing a substrate to a light. <P>COPYRIGHT: (C)2009,JPO&INPIT |
