发明名称 THIN-FILM FORMING METHOD, MANUFACTURING METHOD OF ORGANIC ELECTROLUMINESCENT ELEMENT, MANUFACTURING METHOD OF SEMICONDUCTOR ELEMENT, AND MANUFACTURING METHOD OF OPTICAL ELEMENT
摘要 PROBLEM TO BE SOLVED: To provide a method which pattern-forms a thin film in a prescribed region on a substrate by using liquid materials by an application method at low cost and simply and easily, and a manufacturing method of an organic electroluminescent element, a semiconductor element, and an optical element which are obtained by using the pattern-formation method. SOLUTION: This method forms the thin film in the prescribed region by applying the liquid materials 16a including thin-film forming materials on the substrate 11, and has a process in which the substrate 11 is treated in liquid-repellency so that a liquid-repellent surface A is formed on the substrate 11, a process in which, on the liquid-repellent surface A of the substrate 11, a foundation layer 15 is formed that has a larger lyophillic property than this face with respect to the liquid material 16a, and a process in which the liquid material 16a is applied on the foundation layer 15, and dried. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009009833(A) 申请公布日期 2009.01.15
申请号 JP20070170487 申请日期 2007.06.28
申请人 SUMITOMO CHEMICAL CO LTD 发明人 ITO NORITO
分类号 H05B33/10;H01L51/50 主分类号 H05B33/10
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