发明名称 |
CRYSTALLINE FILM DEVICES, APPARATUSES FOR AND METHODS OF FABRICATION |
摘要 |
Methods of depositing thin film materials having crystalline content are provided. The methods use plasma enhanced chemical vapor deposition. According to one embodiment of the present invention, microcrystalline silicon films are obtained. According to a second embodiment of the present invention, crystalline films of zinc oxide are obtained. According to a third embodiment of the present invention, crystalline films of iron oxide are obtained.
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申请公布号 |
US2009017601(A1) |
申请公布日期 |
2009.01.15 |
申请号 |
US20080111126 |
申请日期 |
2008.04.28 |
申请人 |
JEWETT RUSSELL F;PUGH STEVEN F;WICKBOLDT PAUL |
发明人 |
JEWETT RUSSELL F.;PUGH STEVEN F.;WICKBOLDT PAUL |
分类号 |
H01L21/205 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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