Exposure apparatus and device manufacturing method

摘要

An immersion lithographic system for patterning a work piece arranged at an image plane and covered at least partly with a layer sensitive to electromagnetic radiation, includes: a source emitting electromagnetic radiation onto an object plane; a mask arranged at the object plane to relay the electromagnetic radiation toward the work piece; and an immersion medium contacting at least a portion of an immersion optics of the lithographic system and a portion of the work piece. The immersion medium is supplied through at least one orifice arranged in the immersion optics.