发明名称 |
SEMICONDUCTOR DEVICE, AND MANUFACTURING METHOD THEREOF |
摘要 |
PROBLEM TO BE SOLVED: To obtain a highly reliable semiconductor device, by so solving various problems caused by the steps of its floating gate that the degradation of its characteristics as a semiconductor memory are suppressed, in a simple and sure manner. SOLUTION: In the semiconductor device, an outermost-end side surface (end portion 23b) of a dummy floating gate 23a of a dummy cell 20a which exists on the side of an interface portion 12 is so formed as to be a slack inclined surface, and its inclined angle is so formed as to be smaller than the inclined angle of another side surface of the dummy floating gate 23a and the inclined angle of the side surface of each floating gate 23. COPYRIGHT: (C)2009,JPO&INPIT |
申请公布号 |
JP2009010230(A) |
申请公布日期 |
2009.01.15 |
申请号 |
JP20070171151 |
申请日期 |
2007.06.28 |
申请人 |
FUJITSU MICROELECTRONICS LTD |
发明人 |
ARIYOSHI JUNICHI;ANEZAKI TORU;MORIOKA HIROSHI |
分类号 |
H01L21/8247;H01L21/3065;H01L27/115;H01L29/788;H01L29/792 |
主分类号 |
H01L21/8247 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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