发明名称 HEAT TREATMENT JIG FOR WAFER AND VERTICAL HEAT TREATMENT BOAT PROVIDED WITH THE JIG
摘要 <p>Provided is a board-like heat treatment jig for a wafer. The jig supports the semiconductor silicon wafer by horizontally placing it on the jig for heat treatment. The jig has a doughnut shape with a hole penetrating the center portion. On a surface for placing the semiconductor silicon wafer, a ring-like protruding section is formed. The ring-like protruding section protrudes in a full-ring shape without a cut, and supports the placed semiconductor silicon wafer. The jig has three or more ring-like protruding sections which are concentrically formed with the same height.Thus, at the time of performing heat treatment to the semiconductor silicon wafer in a vertical heat treatment furnace, slip dislocation is suppressed. The vertical heat treatment boat provided with such jig is also provided.</p>
申请公布号 WO2009008124(A1) 申请公布日期 2009.01.15
申请号 WO2008JP01443 申请日期 2008.06.06
申请人 SHIN-ETSU HANDOTAI CO., LTD.;MIZUNO, MICHIHIRO 发明人 MIZUNO, MICHIHIRO
分类号 H01L21/22;H01L21/324 主分类号 H01L21/22
代理机构 代理人
主权项
地址