METHOD FOR DEPOSITION OF AN ANTI-SCRATCH COATING

摘要

Process for the vacuum deposition of at least one boron-based thin film on a substrate, characterized in that: at least one sputtering species that is chemically inactive or active with respect to boron is chosen; a collimated beam of ions comprising predominantly said sputtering species is generated using at least one linear ion source positioned within an installation of industrial size; said beam is directed onto at least one boron-based target; and at least one surface portion of said substrate facing said target is positioned in such a way that said material sputtered by the ion bombardment of the target or a material resulting from the reaction of said sputtered material with at least one of the sputtering species is deposited on said surface portion.