发明名称 SOLID STATE IMAGING APPARATUS AND METHOD FOR FABRICATING THE SAME
摘要 A semiconductor device of the present invention includes a substrate; an imaging region which is formed at part of the substrate and in which photoelectric conversion cells including photoelectric conversion sections are arranged in the form of an array; a control-circuit region which is formed at part of the substrate and in which the imaging region is controlled and a signal from the imaging region is outputted; and a copper-containing interconnect layer formed above the substrate and made of a material containing copper. Furthermore, a first anti-diffusion layer and a second anti-diffusion layer are formed, as anti-diffusion layers for preventing the copper from diffusing into each photoelectric conversion section, on the photoelectric conversion section and the copper-containing interconnect layer, respectively.
申请公布号 US2009014759(A1) 申请公布日期 2009.01.15
申请号 US20080233080 申请日期 2008.09.18
申请人 MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 发明人 MORI MITSUYOSHI;UCHIDA MIKIYA;FUJIWARA KAZUO;YAMAGUCHI TAKUMI
分类号 H01L31/113;H01L21/3205;H01L21/768;H01L23/52;H01L23/532;H01L27/146 主分类号 H01L31/113
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