发明名称 CONTACT STRUCTURE FOR A SEMICONDUCTOR COMPONENT AND A METHOD FOR PRODUCTION THEREOF
摘要 A semiconductor component (1) comprises a substrate (2) having a first side (3) and a second side (4) and a multilayer contact structure (9) which is arranged on at least one side (3, 4) of the substrate (2), wherein the contact structure (9) has a barrier layer (6) for preventing the diffusion of ions from that side of the barrier layer (6) which is opposite the substrate (2) into the substrate (2).
申请公布号 WO2009006988(A1) 申请公布日期 2009.01.15
申请号 WO2008EP04960 申请日期 2008.06.19
申请人 DEUTSCHE CELL GMBH;KRAUSE, ANDREAS;BITNAR, BERND;NEUHAUS, HOLGER;KUTZER, MARTIN 发明人 KRAUSE, ANDREAS;BITNAR, BERND;NEUHAUS, HOLGER;KUTZER, MARTIN
分类号 H01L31/0224;C23C28/02;C25D5/02;C25D5/12;H01L21/288 主分类号 H01L31/0224
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