发明名称 APPARATUS AND METHOD FOR PLASMA DOPING
摘要 Gas supplied to gas flow passages of a top plate from a gas supply device by gas supply lines forms flow along a vertical direction along a central axis of a substrate, so that the gas blown from gas blow holes can be made to be uniform, and a sheet resistance distribution is rotationally symmetric around a substrate center.
申请公布号 WO2008123391(A3) 申请公布日期 2009.01.15
申请号 WO2008JP56002 申请日期 2008.03.21
申请人 PANASONIC CORPORATION;SASAKI, YUICHIRO;OKUMURA, TOMOHIRO;ITO, HIROYUKI;NAKAMOTO, KEIICHI;OKASHITA, KATSUMI;MIZUNO, BUNJI 发明人 SASAKI, YUICHIRO;OKUMURA, TOMOHIRO;ITO, HIROYUKI;NAKAMOTO, KEIICHI;OKASHITA, KATSUMI;MIZUNO, BUNJI
分类号 H01J37/32;H01L21/00 主分类号 H01J37/32
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