| 摘要 |
<p>An exposure apparatus and device fabrication method is provided to measure wavefront aberration, effective source distribution and diffracted light distribution without degradation of the stage performance. An exposure apparatus(1) of step and scan type includes a projection optical system(30) projecting the pattern of the reticle(20) on a substrate, a wafer stage(45) moving the substrate and a sensor unit(700) receives the light passes through the projection optical system. The sensor unit includes an aperture plate(760) in which a plurality of aperture patterns having different shape or the size is formed, and it also includes photoelectric conversion element(740) converting photoelectrical flux from a plurality of aperture patterns. A plurality of aperture patterns comprises the aperture pattern of the rectangular shape and aperture pattern of circular. The aperture pattern of circular is used for measuring the effective source distribution formed by the illumination optical system illuminating reticle.</p> |
