SUPERCRITICAL FLUID GENERATING APPARATUS, AND FACILITY AND METHOD FOR TREATING SUBSTRATE WITH THE SAME

摘要

The substrate processing equipment including the photoresist strip is provided to reduce the processing time by keeping the concentration of the supercritical fluid constantly. The process gas supplying member(210) supplies the process gas. The processing solution supply member(220) supplies the processing liquid. The mixing member(230) is provided with the process gas and processing liquid from the process gas feed member and processing solution supply member. The mixing member comprises the mixer(236) mixing the process gas and processing liquid, the housing(232) for providing the space for producing the supercritical fluid, and the heater(234), heating up the housing.