| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a density distribution mask for forming a lens array by disposing unit lenses in an array form on a substrate by a photolithography step, capable of easily changing the curvature radius of the boundary part between the lenses without causing moire in the mask or the lens array. <P>SOLUTION: In this mask, each pattern constituting a unit lens is disposed so that the center thereof is located on an intersection of vertical and horizontal grids of equal intervals, and square patterns are disposed on the intersections of the grids so that the square patterns are alternated to thereby a density distribution. The size of the unit lens is even times as large as the interval of the grids, and the unit lenses are formed in an array shape. <P>COPYRIGHT: (C)2009,JPO&INPIT</p> |
