| 摘要 |
Systems and methods for vertically integrating semiconductor devices are described. In one embodiment, a method comprises providing an interposer, aligning and bonding a plurality of die to a first surface of the interposer, aligning and bonding a backplate to the plurality of die, and reducing at least one portion of the interposer to create a reconstituted wafer. In another embodiment, an apparatus comprises an interposer operable to receive at least one donor semiconductor device disposed on a first surface of the interposer and aligned therewith, and at least one host semiconductor device disposed on a second surface of the interposer and aligned therewith; where the interposer allows the at least one donor and host semiconductor devices to become vertically integrated. |
