HALFTONE MASK, MANUFACTURING METHOD AND ACTIVE MATRIX TYPE DISPLAY APPARATUS

摘要

A halftone mask, an active matrix type display device, and a method for preparing the halftone mask are provided to inhibit the increase of parasitic capacity and to obtain high definition image display. A halftone mask(500) used for forming a resist pattern having different film thickness comprises a first mask pattern(502) which is used to form a first resist pattern; a second mask pattern(503) which is used to form a second resist pattern having the thickness smaller than that of the first resist pattern; and a third mask pattern(504) which is used to form a third resist pattern formed in at least some part of the edge region of the second mask pattern and having the thickness larger than that of the second resist pattern.