SUBSTRATE HEATING APPARATUS

摘要

The apparatus for heating a substrate is provided to prevent the deterioration of the efficiency of the thin film by providing the heat energy to the substrate backside. The apparatus for heating a substrate comprises the chamber(100), the substrate support portion(200), the heating means(300) posted at the rear side of the substrate(10). The upper heating means comprises a plurality of reflecting bodies(310), and a plurality of lamp heater parts(320), and the short wavelength shield(330) prepared in the lamp heater part. The chamber comprises the chamber body(110) whose inside is vacant and the chamber lid(120) covering the chamber body. The chamber body comprises sidewalls whose upper part is opened, and the floor sides which are protruded as the pillar shape. The floor side is polygon, circular shape or ellipse. The chamber lid seals the reaction space and couples with the chamber body.