POLISHING PAD AND METHOD OF MANUFACTURING THE SAME

摘要

A grinding pad is provided to lower a rate of generating scratch by forming uniformly a plurality of pores and to manufacture a plurality of uniform grinding pads with a process of one time. A grinding pad contains a high molecule elastomer layer(3) and hollow tube-shaped structures(5) arranged within the high molecule elastomer layer in a vertical direction to a longitudinal direction of the high molecule elastomer layer or an inclined direction. Air bubbles(L) are formed in a surface of the grinding pad. The high molecule elastomer layer is one selected from polyurethane resin and polyurea resin.