Use of an aqueous dispersion for chemical mechanical polishing and process for producing a semiconductor device,申请号EP20030017358-传众专利搜索

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发明名称	Use of an aqueous dispersion for chemical mechanical polishing and process for producing a semiconductor device
摘要
申请公布号	EP1386949(B1)	申请公布日期	2009.01.14
申请号	EP20030017358	申请日期	2003.07.31
申请人	JSR CORPORATION	发明人	KONNO, TOMOHISA;MOTONARI, MASAYUKI;HATTORI, MASAYUKI;KAWAHASHI, NOBUO
分类号	H01L21/304;C09G1/02;C09K3/14	主分类号	H01L21/304
代理机构		代理人
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地址

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