| 摘要 |
<p>The exposure apparatus and the method of manufacturing the device are provided to improve the detection accuracy rate by detecting the location of reticle and location of substrate. The optical system(30) comprises the optical member which can change the position. The photoelectric conversion element receives the light from the mark for detecting the location of the reticle(20) and location of substrate and outputs the detection signal. The controller(90) controls the location of the optical member based on the information of the first estimation and the second estimation. The information about the first estimation presents the symmetric of the waveform of the detection signal. The information about the second estimate presents the mismatch of the location of mark.</p> |
