| 摘要 |
PROBLEM TO BE SOLVED: To center a wafer easily by locating a wafer on a base plate formed with a wafer disposition recess which has a slant peripheral edge, and then applying photo resist onto the wafer after fixing the wafer with a mask having a wafer presser section. SOLUTION: A base plate 2 is made of Al and has a wafer disposition recess (recess) 8 to dispose a quartz wafer 1. The peripheral edge of the recess has a slant face 9 which is sloping from upward to downward in a cross-sectional view. A quartz wafer 1 is disposed in the recess 8 of the base plate 2 which automatically centers a quartz wafer 1 when the wafer is disposed, Next, a wafer presser mask 3 is set in the base plate 2 to hold the wafer by a presser section 7. Thereafter, the base plate 2 disposed with the quartz wafer 1 is rotated and photo resist is jetted out and applied onto the wafer 1 through the wafer presser mask 3. After application of the photo resist, the wafer presser mask 3 is removed from the base plate 2. |
