发明名称 ROTATABLE CONTAMINATION BARRIER AND LITHOGRAPHIC APPARATUS COMPRISING SAME
摘要 <p>A rotatable contamination barrier (1) for use with an EUV radiation system is disclosed. The contamination barrier (1) has a blade structure (2) configured to trap contaminant material coming from a radiation source (6), a bearing structure, coupled to a static frame, configured to rotatably bear the blade structure (2), and an eccentric mass element (12) displaced relative to a central axis of rotation (13) to balance the blade structure (12) in the bearing structure.</p>
申请公布号 KR20090005342(A) 申请公布日期 2009.01.13
申请号 KR20087026492 申请日期 2007.03.16
申请人 ASML NETHERLANDS B.V. 发明人 VAN DEN WILDENBERG LAMBERTUS ADRIANUS
分类号 H01L21/027 主分类号 H01L21/027
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