发明名称 Multi-gate FET with multi-layer channel
摘要 The invention concerns a field-effect transistor with a drain, a source, a channel in electrical contact with the source and the drain, and at least one gate, so as to apply an electric field to the channel when each gate is polarized, where the channel has a multi-layer structure with at least three layers, and with at least one of the layers of the multi-layer structure having electrical properties that are substantially different from those of another layer of the multi-layer structure, and wherein a single gate or two gates are arranged substantially perpendicular to a reference plane of the channel defined by an interface plane between two layers of the multi-layer structure.
申请公布号 US7476930(B2) 申请公布日期 2009.01.13
申请号 US20070773816 申请日期 2007.07.05
申请人 S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES 发明人 ALLIBERT FREDERIC;AKATSU TAKESHI;GHYSELEN BRUNO
分类号 H01L29/772 主分类号 H01L29/772
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