发明名称 |
Method for manufacturing thin film transistor |
摘要 |
An object of the invention is to provide a method for manufacturing a thin film transistor in a self-aligning manner by using the droplet discharging method regardless of the accuracy of a discharge position for a droplet discharging device. In view of the object, an organic resin film or the like is applied and processed into a predetermined shape by etch-back, exposure, development and the like. By utilizing the organic resin film with the predetermined shape as a mask, a semiconductor layer containing an impurity of one conductivity type is etched. By utilizing the organic resin film with the predetermined shape, regions with different wettabilities are formed. |
申请公布号 |
US7476572(B2) |
申请公布日期 |
2009.01.13 |
申请号 |
US20050592527 |
申请日期 |
2005.03.15 |
申请人 |
SEMICONDUCTOR ENERGY LABORATORY CO., LTD. |
发明人 |
MORISUE MASAFUMI;FUJII GEN |
分类号 |
H01L21/00;H01L21/288;H01L21/3205;H01L21/336;H01L21/77;H01L21/84;H01L27/12;H01L29/417;H01L29/45;H01L29/49;H01L29/786 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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