发明名称 CHARGED PARTICLE BEAM WRITING APPARATUS AND METHOD
摘要 A charged particle beam imaging device, and a charged particle beam imaging method are provided to allow the charged particle beam to be imaged with a high precision by correcting the distortion of the central coordination of SF and SF itself. A charged particle beam imaging device(100) comprises an irradiation part which irradiates a charged particle beam; a stage(105) which loads a sample of the imaged target; a first correction part which corrects the reference position of the small region in the imaged region of the sample based on the pattern distortion obtained from the position of a plurality of figures imaged without correction; a first deflector which deflects the charged particle beam based on the corrected reference position; a second correction part which corrects the relative distance from the corrected reference position to the arbitrary position of the small region by using the coefficient of the correction equation and the reference position; and a second deflector which deflects the charged particle beam fro the position deflected by the first deflector based on the relative distance after correction.
申请公布号 KR20090004730(A) 申请公布日期 2009.01.12
申请号 KR20080064623 申请日期 2008.07.04
申请人 NUFLARE TECHNOLOGY INC. 发明人 ABE TAKAYUKI
分类号 G03F7/20 主分类号 G03F7/20
代理机构 代理人
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