POLISHING PAD AND METHOD OF MANUFACTURING THE SAME

摘要

A polishing pad and a manufacturing method thereof are provided to allow an adhesive to infiltrate evenly and prevent exfoliation from the base film effectively by forming ultrafine fiber noil of appropriate length on the back side. A polishing pad(A) comprises non-woven in which interlaced ultrafine fiber with the fineness of 0.001~0.3 denier is formed, and polymer elastomer impregnated in the non-woven. Noil(A1) in which the implanted of the ultrafine fiber is formed into the length of 0.5~2mm is formed on the back side of the polishing pad.