APPARATUS AND METHOD FOR MAKING ETCHING AREA ON SUBSTRATE

摘要

An apparatus and a method for forming an etching region on a substrate are provided to prevent an etching region and a non-etching region from being generated abnormally due to the align error when adhering a soft mold and a substrate. A base plate(4) is installed inside a frame(2). A chamber case(6) is installed in a frame to be separated from a base plate. A soft mold(8) has a pattern surface to classify an etching region and a non-etching region. The soft mold is positioned in the sealing space of the chamber case. A stage(12) has a substrate loading surface. The stage is positioned in the sealing space of the chamber case to be separated from the soft mold. A driving unit(16) is fixed to the base plate. The driving unit generates the power for attaching the soft mold and the substrate. An alignment unit compensates for the attaching position of the substrate according to the position of the soft mold.