METHOD OF ARRAYING MASK PATTERNS AND APPARATUS USING THE SAME

摘要

The method for arranging the mask pattern and apparatus using the same are provided to rapidly determine the arrangement of the proper assist feature about the shape of the main feature of mask and arrangement. The distribution comprising the contribution of the assist feature about the image intensity on the main feature of function is obtained(S10). The peripheral region of the arbitrary fixed region comprising the main feature is divided to the limited region(S33). The distribution of function stands opposite with the central value of the divided region is distributed. The location of the assist feature is determined by using the polygonal areas consisting of the identical representative values(S37).