发明名称 Semiconductor device with reduced electromigration
摘要 A high reliability semiconductor device is provided which can prevent electromigration due to the deposition of metal ions originating from wires. The device includes: a flexible wiring board 11 including a base film 1 and multiple wires 9; a semiconductor chip 5 mounted to the flexible wiring board 11; and a sealing resin 6 disposed between the flexible wiring board 11 and the semiconductor chip 5 so as to at least partially in contact with the wires 9. The sealing resin 6 contains a metal ion binder mixed thereto.
申请公布号 US7474008(B2) 申请公布日期 2009.01.06
申请号 US20050133379 申请日期 2005.05.20
申请人 SHARP KABUSHIKI KAISHA 发明人 FUKUTA KAZUHIKO;TOYOSAWA KENJI;KIDOGUCHI TAKASHI
分类号 H01L23/28;H01L23/29;H01L21/56;H01L21/60;H01L23/12;H01L23/14;H01L23/31;H01L23/48;H01L23/498;H05K1/00;H05K3/28;H05K3/30 主分类号 H01L23/28
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