发明名称 Method and apparatus for reducing dielectric charging in MEMS structures
摘要 A Micro-Electro-Mechanical system (MEMS) device includes a doped semiconductor layer that is disposed outwardly from a substrate. The MEMS device further includes an insulation layer that is disposed outwardly from and in contact with the doped semiconductor layer. The MEMS device also includes a conductive membrane that is disposed outwardly from the insulation layer by a distance that defines an air gap between the conductive membrane and the insulation layer. The conductive membrane is operable to come in contact with the insulation layer when an appropriate voltage is applied between the conductive membrane and the doped semiconductor layer. In one particular embodiment, the combination of the doped semiconductor layer and the insulation layer operates to provide a path to dissipate any excess electrical charge received by the insulation layer.
申请公布号 US7474171(B2) 申请公布日期 2009.01.06
申请号 US20050143410 申请日期 2005.06.01
申请人 RAYTHEON COMPANY 发明人 MORRIS FRANCIS J.
分类号 H01P1/10 主分类号 H01P1/10
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