发明名称 |
Assembly, a lithographic apparatus, and a device manufacturing method |
摘要 |
A lithographic apparatus includes a projection optics assembly for projecting a patterned beam onto a target portion of a substrate. The projection optics assembly includes a first element having a predetermined functionality that is positioned with respect to a second element in a spaced relationship on a support frame. The support frame has an interface surface formed on or in the support frame for receiving the first element. The interface surface determines the position of the first element with respect to the second element, and is configured in accordance with the predetermined functionality so that the first element is positionable with respect to the second element with at least three degrees of freedom.
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申请公布号 |
US7474378(B2) |
申请公布日期 |
2009.01.06 |
申请号 |
US20040968467 |
申请日期 |
2004.10.20 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
FRANKEN DOMINICUS JACOBUS PETRUS ADRIANUS |
分类号 |
G03B27/42;G02B7/02;G02B26/08;G03B27/54;G03F7/20;H01L21/027 |
主分类号 |
G03B27/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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