发明名称 Semiconductor device and method of manufacturing the same
摘要 A semiconductor device comprises a bottom electrode, a top electrode, and a dielectric film provided between the bottom electrode and the top electrode and made of a perovskite type ferroelectrics containing Pb, Zr, Ti and O, the dielectric film comprising a first portion formed of a plurality of crystal grains partitioned by grain boundaries having a plurality of directions.
申请公布号 US7473565(B2) 申请公布日期 2009.01.06
申请号 US20050177281 申请日期 2005.07.11
申请人 KABUSHIKI KAISHA TOSHIBA;INFINEON TECHNOLOGIES AG 发明人 ARISUMI OSAMU;IMAI KEITARO;YAMAKAWA KOJI;MOON BUM-KI
分类号 H01L21/00;H01L21/02 主分类号 H01L21/00
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