发明名称 Method of forming an oxide film, an oxide film, a component and an electronic apparatus
摘要 A method of forming an oxide film 3 on a surface of a base material 12 constituted from an inorganic material is disclosed. The oxide film 3 is constituted from a material containing an oxide of the inorganic material as a major component thereof. The method includes the steps of: preparing the base material 12; supplying a process liquid containing alcohol onto the surface of the base material 12 to form a liquid film 2 of the process liquid thereon; producing an oxide of the inorganic material through a reaction of the inorganic material with the alcohol in the liquid film 2; and eliminating the process liquid remaining in the liquid film 2 to form the oxide film 3 on the surface of the base material 12. Further, the oxide film 3 described above, a component including the oxide film 3, and an electronic apparatus including the component are disclosed.
申请公布号 US7473654(B2) 申请公布日期 2009.01.06
申请号 US20050199421 申请日期 2005.08.08
申请人 SEIKO EPSON CORPORATION 发明人 HASHI YUKIHIRO
分类号 H01L21/44 主分类号 H01L21/44
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