发明名称 Composition for forming silicon film and method for forming silicon film
摘要 There are provided a silicon-film-forming composition containing silicon particles and a dispersion medium and a method for forming a silicon film by forming a coating film of the silicon-film-forming composition on a substrate and subjecting the coating film to instantaneous fusion, a heat treatment or a light treatment. According to the composition and the method, a polysilicon film with a desired thickness which may be used as a silicon film for a solar battery can be formed efficiently and easily.
申请公布号 US7473443(B2) 申请公布日期 2009.01.06
申请号 US20040515728 申请日期 2004.11.26
申请人 JSR CORPORATION 发明人 MATSUKI YASUO;IWASAWA HARUO;KATO HITOSHI
分类号 B05D3/06;B05D3/02;C23C24/10;C23C26/02;H01L21/208 主分类号 B05D3/06
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