Polymere, Resistzusammensetzungen und Verfahren zur Herstellung eines Resistmusters,申请号DE2001631921T-传众专利搜索

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发明名称	Polymere, Resistzusammensetzungen und Verfahren zur Herstellung eines Resistmusters
摘要
申请公布号	DE60131921(T2)	申请公布日期	2009.01.02
申请号	DE2001631921T	申请日期	2001.04.27
申请人	SHIN-ETSU CHEMICAL CO. LTD.	发明人	HASEGAWA, KOJI;NISHI, TSUNEHIRO;KINSHO, TAKESHI;WATANABE, TAKERU;NAKASHIMA, MUTSUO;TACHIBANA, SEEICHIRO;HATAKEYAMA, JUN
分类号	G03F7/039;C08F222/06;C08F222/40;C08F232/08;G03F7/004	主分类号	G03F7/039
代理机构		代理人
主权项
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