发明名称 |
Exposure apparatus, exposure method and optical proximity correction method |
摘要 |
There is disclosed an exposure apparatus which includes an illumination optical system including a light source which emits illumination light, a mask stage which holds a photomask having a mask pattern thereon to be illuminated with the illumination light, and a light intensity distribution filter arranged on a plane, which plane is positioned in the illumination optical system and is optically in relation of Fourier transform to the mask pattern, the light intensity distribution filter configured to vary a light intensity distribution of the illumination light in a cross section of a bundle of the illumination light.
|
申请公布号 |
US2009004581(A1) |
申请公布日期 |
2009.01.01 |
申请号 |
US20070907191 |
申请日期 |
2007.10.10 |
申请人 |
FUKUHARA KAZUYA;HIGASHIKI TATSUHIKO |
发明人 |
FUKUHARA KAZUYA;HIGASHIKI TATSUHIKO |
分类号 |
G03C5/00;G03B27/72;G03F7/00 |
主分类号 |
G03C5/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|