发明名称 Lighting Apparatus, Exposure Apparatus And Microdevice Manufacturing Method
摘要 An illumination apparatus for illuminating a surface (M) to be irradiated with illumination light emitted from a light source (2) comprises a reflection type fly-eye optical systems (12, 14) disposed between the light source (2) and the surface (M) to be irradiated and constituted by a plurality of reflection partial optical systems for wavefront-dividing a light beam from the light source (2) and superposing divided portions of the light beam onto each other on the surface (M) to be irradiated and a reflection type optical system (10) disposed between the light source (2) and the reflection type fly-eye optical systems (12, 14) for guiding the illumination light to the reflection type fly-eye optical systems (12, 14). The reflection type optical system (10) has a reflecting surface at least partly constructed by a diffusing surface.
申请公布号 US2009002662(A1) 申请公布日期 2009.01.01
申请号 US20050660927 申请日期 2005.09.21
申请人 NIKON CORPORATION 发明人 KOMATSUDA HIDEKI
分类号 G03B27/54 主分类号 G03B27/54
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