发明名称 METHOD FOR FORMING DUAL BIT LINE METAL LAYERS FOR NON-VOLATILE MEMORY
摘要 Structures and techniques are disclosed for reducing bit line to bit line capacitance in a non-volatile storage system. The bit lines are formed at a 4f pitch in each of two separate metal layers, and arranged to alternate between each of the layers. In an alternative embodiment, shields are formed between each of the bit lines on each metal layer.
申请公布号 US2009004843(A1) 申请公布日期 2009.01.01
申请号 US20070768461 申请日期 2007.06.26
申请人 MOKHLESI NIMA;WAN JUN 发明人 MOKHLESI NIMA;WAN JUN
分类号 H01L21/768 主分类号 H01L21/768
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