发明名称 INTEGRATED CIRCUIT AND SEED LAYERS
摘要 Structures are provided that include a conducting layer disposed on a layered arrangement of a diffusion barrier layer and a seed layer in an integrated circuit. Apparatus and systems having such structures and methods of forming these structures for apparatus and systems are disclosed.
申请公布号 US2009001586(A1) 申请公布日期 2009.01.01
申请号 US20080145382 申请日期 2008.06.24
申请人 MICRON TECHNOLOGY, INC. 发明人 FARRAR PAUL A.
分类号 H01L23/52;H01L21/4763;H01L21/768 主分类号 H01L23/52
代理机构 代理人
主权项
地址
您可能感兴趣的专利