发明名称 SUBSTRATE TREATING APPARATUS
摘要 A substrate treating apparatus includes a plurality of substrate treatment lines arranged vertically. Each substrate treatment line has a plurality of main transport mechanisms arranged horizontally, and a plurality of treating units provided for each main transport mechanism for treating substrates. A series of treatments is carried out for the substrates, with each main transport mechanism transporting the substrates to the treating units associated therewith, and transferring the substrates to the other main transport mechanism horizontally adjacent thereto. The substrate treating apparatus realizes increased processing capabilities by treating the substrates in parallel through the substrate treatment lines.
申请公布号 US2009000543(A1) 申请公布日期 2009.01.01
申请号 US20080163951 申请日期 2008.06.27
申请人 SOKUDO CO., LTD. 发明人 FUKUTOMI YOSHITERU;MITSUHASHI TSUYOSHI;OGURA HIROYUKI;MORINISHI KENYA;KAWAMATSU YASUO;NAGASHIMA HIROMICHI
分类号 B05C11/00;B05C13/00 主分类号 B05C11/00
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