发明名称 |
Method of manufacturing micro-optic device |
摘要 |
A micro-optic device including a complicate structure and a movable mirror is made to be manufactured in a reduced length of time. A silicon substrate and a single crystal silicon device layer with an intermediate layer of silicon dioxide interposed therebetween defines a substrate on which a layer of mask material is formed and is patterned to form a mask having the same pattern as the configuration of the intended optical device as viewed in plan view. A surface which is to be constricted as a mirror surface is chosen to be in a plane of the silicon crystal. Using the mask, the device layer is vertically etched by a reactive ion dry etching until the intermediate layer is exposed. Subsequently, using KOH solution, a wet etching which is anisotropic to the crystallographic orientation is performed with an etching rate which is on the order of 0.1 mum/min for a time interval on the order of ten minutes is performed to convert the sidewall surface of the mirror into a smooth crystallographic surface. Subsequently, the intermediate layer is selectively subject to a wet etching to remove the intermediate layer only in an area located below the movable part of the optical device.
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申请公布号 |
US2009004765(A1) |
申请公布日期 |
2009.01.01 |
申请号 |
US20080070931 |
申请日期 |
2008.02.22 |
申请人 |
JAPAN AVIATION ELECTRONICS INDUSTRY LIMITED |
发明人 |
KATO YOSHICHIKA;YOSHIDA SATOSHI;MORI KEIICHI;KONDOU KENJI;HAMADA YOSHIHIKO;IMAKI OSAMU |
分类号 |
H01L21/02;B81B3/00;B81C1/00;G02B6/35;G02B26/08 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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